Abstract
Precise and fast computation of aerial images are essential. Typical lithographic simulators employ a Köhler illumination system for which aerial imagery is obtained using a large number of Transmission Cross Coefficients (TCCs). These are generally computed by a slow numerical evaluation of a double integral. We review the general framework in which the 2D imagery is solved and then propose a fast and accurate method to obtain the TCCs. We acquire analytical solutions and thus avoid the complexity-accuracy trade-off encountered with numerical integration. Compared to other analytical integration methods, the one presented is faster, more general and more tractable.
| Original language | English |
|---|---|
| Title of host publication | Optical Microlithography XXVIII |
| Editors | Kafai Lai, Andreas Erdmann |
| Publisher | SPIE |
| ISBN (Electronic) | 9781628415285 |
| DOIs | |
| Publication status | Published - 2015 |
| Externally published | Yes |
| Event | Optical Microlithography XXVIII - San Jose, United States Duration: 24 Feb 2015 → 26 Feb 2015 |
Publication series
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Volume | 9426 |
| ISSN (Print) | 0277-786X |
| ISSN (Electronic) | 1996-756X |
Conference
| Conference | Optical Microlithography XXVIII |
|---|---|
| Country/Territory | United States |
| City | San Jose |
| Period | 24/02/15 → 26/02/15 |
Bibliographical note
Publisher Copyright:© 2015 SPIE.