Charge transfer at oxygen/zirconia interface at elevated temperatures Part 7: Effect of surface processing

Janusz Nowotny, T. Bak, C. C. Sorrell

Research output: Contribution to journalArticlepeer-review

14 Citations (Scopus)

Abstract

The present paper considers the effect of surface processing procedures, such as polishing and subsequent annealing, on oxidation mechanisms and related charge transfer at the oxygen/zirconia interface at elevated temperatures. The studies were performed on yttria-stabilised cubic zirconia (10 mol-%Y2O3) with three surface types: unpolished (as sintered at 1673 K), sintered at 1673 K and then polished, and sintered at 1673 K, polished and reannealed at 1673 K. Work function measurements were used to examine the effect of the applied surface processing procedures on the reactivity of zirconia with oxygen and related charge transfer. This examination involved monitoring changes in work function during oxidation at 1073 and 1173 K. It is shown that surface processing has an effect on the oxidation kinetics and mechanism at both temperatures. Differences in WF data are considered in terms of the local properties of the surface defects formed during processing.

Original languageEnglish
Pages (from-to)195-199
Number of pages5
JournalAdvances in Applied Ceramics
Volume104
Issue number4
DOIs
Publication statusPublished - Aug 2005
Externally publishedYes

Keywords

  • Defect chemistry
  • Surface processing
  • Work function
  • Yttria-stabilised zirconia

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