Chemically-induced electric field : flat band potential engineering

T. Bak, Z. Guo, W. Li, A. J. Atanacio, J. Nowotny

Research output: Contribution to journalArticlepeer-review

Abstract

The present work considers engineering of the flat band potential, FBP, of metal oxides in a controlled manner. The aim is to minimise the energy losses related to recombination. The related experimental approaches include imposition of a chemically-induced electric field using the phenomena of segregation, diffusion and the formation of multilayer systems. This paper considers several basic phenomena that allow the modification of the surface charge and the space charge at the gas/solid and solid/liquid interfaces.
Original languageEnglish
Number of pages7
JournalProceedings of SPIE - International Society for Optical Engineering
Volume8469
DOIs
Publication statusPublished - 2012

Keywords

  • electric fields
  • energy conversion
  • metallic oxides
  • solar energy

Fingerprint

Dive into the research topics of 'Chemically-induced electric field : flat band potential engineering'. Together they form a unique fingerprint.

Cite this