Chromium doping of Ta3N5 thin films via thermal nitridation of sputtered tantalum oxide films

Sam Macartney; Rong Liu; Richard Wuhrer; Leigh R. Sheppard

doi:10.1016/j.matchemphys.2020.123838

Chromium doping of Ta3N5 thin films via thermal nitridation of sputtered tantalum oxide films

Sam Macartney, Rong Liu, Richard Wuhrer, Leigh R. Sheppard

Western Sydney University

Research output: Contribution to journal › Article › peer-review

Abstract

The effects of chromium doping on magnetron sputtered and thermally annealed Ta3N5 thin films have been investigated for the first time. The structural and compositional evolution of these films were closely investigated using XRD, SEM and SIMS. A simple mechanism for the incorporation of chromium into the Ta3N5 lattice was described based on kinetic experiments and SIMS analysis. Some basic recommendations can be made regarding the optimal method of preparing Cr–Ta3N5, however there is still much work to be done in characterising Cr–Ta3N5 with appreciable properties. In particular, this investigation indicates poor Cr solubility in Ta3N5 in spite of the favourable ionic radius.

Original language	English
Article number	123838
Number of pages	15
Journal	Materials Chemistry and Physics
Volume	258
DOIs	https://doi.org/10.1016/j.matchemphys.2020.123838
Publication status	Published - 2021

Keywords

electrolysis
photoelectronchemistry
water

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10.1016/j.matchemphys.2020.123838

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title = "Chromium doping of Ta3N5 thin films via thermal nitridation of sputtered tantalum oxide films",

abstract = "The effects of chromium doping on magnetron sputtered and thermally annealed Ta3N5 thin films have been investigated for the first time. The structural and compositional evolution of these films were closely investigated using XRD, SEM and SIMS. A simple mechanism for the incorporation of chromium into the Ta3N5 lattice was described based on kinetic experiments and SIMS analysis. Some basic recommendations can be made regarding the optimal method of preparing Cr–Ta3N5, however there is still much work to be done in characterising Cr–Ta3N5 with appreciable properties. In particular, this investigation indicates poor Cr solubility in Ta3N5 in spite of the favourable ionic radius.",

keywords = "electrolysis, photoelectronchemistry, water",

author = "Sam Macartney and Rong Liu and Richard Wuhrer and Sheppard, {Leigh R.}",

year = "2021",

doi = "10.1016/j.matchemphys.2020.123838",

language = "English",

volume = "258",

journal = "Materials Chemistry and Physics",

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T1 - Chromium doping of Ta3N5 thin films via thermal nitridation of sputtered tantalum oxide films

AU - Macartney, Sam

AU - Liu, Rong

AU - Wuhrer, Richard

AU - Sheppard, Leigh R.

PY - 2021

Y1 - 2021

N2 - The effects of chromium doping on magnetron sputtered and thermally annealed Ta3N5 thin films have been investigated for the first time. The structural and compositional evolution of these films were closely investigated using XRD, SEM and SIMS. A simple mechanism for the incorporation of chromium into the Ta3N5 lattice was described based on kinetic experiments and SIMS analysis. Some basic recommendations can be made regarding the optimal method of preparing Cr–Ta3N5, however there is still much work to be done in characterising Cr–Ta3N5 with appreciable properties. In particular, this investigation indicates poor Cr solubility in Ta3N5 in spite of the favourable ionic radius.

AB - The effects of chromium doping on magnetron sputtered and thermally annealed Ta3N5 thin films have been investigated for the first time. The structural and compositional evolution of these films were closely investigated using XRD, SEM and SIMS. A simple mechanism for the incorporation of chromium into the Ta3N5 lattice was described based on kinetic experiments and SIMS analysis. Some basic recommendations can be made regarding the optimal method of preparing Cr–Ta3N5, however there is still much work to be done in characterising Cr–Ta3N5 with appreciable properties. In particular, this investigation indicates poor Cr solubility in Ta3N5 in spite of the favourable ionic radius.

KW - electrolysis

KW - photoelectronchemistry

KW - water

UR - http://hdl.handle.net/1959.7/uws:57894

U2 - 10.1016/j.matchemphys.2020.123838

DO - 10.1016/j.matchemphys.2020.123838

M3 - Article

SN - 0254-0584

VL - 258

JO - Materials Chemistry and Physics

JF - Materials Chemistry and Physics

M1 - 123838

ER -

Chromium doping of Ta3N5 thin films via thermal nitridation of sputtered tantalum oxide films

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Keywords

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