Electrodeposition of metallic multilayers by a pulse method

Tzipi Cohen, Joseph Yahalom, Wayne D. Kaplan

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Original language	English
Pages (from-to)	279-284
Number of pages	6
Journal	Reviews in Analytical Chemistry
Volume	18
Issue number	5
DOIs	https://doi.org/10.1515/REVAC.1999.18.5.279
Publication status	Published - 1999

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title = "Electrodeposition of metallic multilayers by a pulse method",

author = "Tzipi Cohen and Joseph Yahalom and Kaplan, {Wayne D.}",

year = "1999",

doi = "10.1515/REVAC.1999.18.5.279",

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pages = "279--284",

journal = "Reviews in Analytical Chemistry",

issn = "0048-752X",

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TY - JOUR

T1 - Electrodeposition of metallic multilayers by a pulse method

AU - Cohen, Tzipi

AU - Yahalom, Joseph

AU - Kaplan, Wayne D.

PY - 1999

Y1 - 1999

UR - https://hdl.handle.net/1959.7/uws:63881

U2 - 10.1515/REVAC.1999.18.5.279

DO - 10.1515/REVAC.1999.18.5.279

M3 - Article

SN - 0048-752X

VL - 18

SP - 279

EP - 284

JO - Reviews in Analytical Chemistry

JF - Reviews in Analytical Chemistry

IS - 5

ER -