Abstract
Despite significant progress in understanding the floating catalyst chemical vapour deposition (FCCVD) process, for the production of various carbon nanotube (CNT) architectures, achieving consistent desired characteristics remains a challenge. In this review, a detailed parametric analysis has been conducted to provide a discourse on the role of all parameters, including diverse collection strategies and the seldom-discussed aspect of safe gas disposal. The review begins by briefly explaining the FCCVD technique, its mechanism, and its evolution over time. This is followed by a systematic discussion of the various constituting units and subunits needed to establish a FCCVD setup, accompanied by a comprehensive analysis of the process. The final section summarizes the key findings and proposes avenues for further investigation and development for future advancements in the field.
Original language | English |
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Article number | 118747 |
Number of pages | 20 |
Journal | Carbon |
Volume | 219 |
DOIs | |
Publication status | Published - 10 Feb 2024 |