Floating catalyst chemical vapour deposition (FCCVD) for direct spinning of CNT aerogel : a review

M. Sehrawat, M. Rani, S. Sharma, S. Bharadwaj, Brian G. Falzon, B. P. Singh

Research output: Contribution to journalArticlepeer-review

Abstract

Despite significant progress in understanding the floating catalyst chemical vapour deposition (FCCVD) process, for the production of various carbon nanotube (CNT) architectures, achieving consistent desired characteristics remains a challenge. In this review, a detailed parametric analysis has been conducted to provide a discourse on the role of all parameters, including diverse collection strategies and the seldom-discussed aspect of safe gas disposal. The review begins by briefly explaining the FCCVD technique, its mechanism, and its evolution over time. This is followed by a systematic discussion of the various constituting units and subunits needed to establish a FCCVD setup, accompanied by a comprehensive analysis of the process. The final section summarizes the key findings and proposes avenues for further investigation and development for future advancements in the field.

Original languageEnglish
Article number118747
Number of pages20
JournalCarbon
Volume219
DOIs
Publication statusPublished - 10 Feb 2024

Fingerprint

Dive into the research topics of 'Floating catalyst chemical vapour deposition (FCCVD) for direct spinning of CNT aerogel : a review'. Together they form a unique fingerprint.

Cite this