Forbidden pitches: Causes, source optimization, and their role in design rules

Ştefan Apostol; Paul Hurley

doi:10.1117/12.2085753

Forbidden pitches: Causes, source optimization, and their role in design rules

Ştefan Apostol, Paul Hurley

IBM

Research output: Chapter in Book / Conference Paper › Conference Paper › peer-review

2 Citations (Scopus)

Abstract

Forbidden pitches are the result of unwanted, non-linear effects that limit yield and not always well understood. Yet, as approximations, they are implicitly deployed through design rules. Many believe they result as a consequence of more complicated light sources. We develop an analytical model of aerial image quality as a function of light source. We show the effect is most pronounced for a point light source, the simplest of all. We develop a method to improve print image quality by illumination source optimization, and show promising first results. Additionally, it is shown how design rules capture forbidden pitches unsatisfactorily.

Original language	English
Title of host publication	Optical Microlithography XXVIII
Editors	Kafai Lai, Andreas Erdmann
Publisher	SPIE
ISBN (Electronic)	9781628415285
DOIs	https://doi.org/10.1117/12.2085753
Publication status	Published - 2015
Externally published	Yes
Event	Optical Microlithography XXVIII - San Jose, United States Duration: 24 Feb 2015 → 26 Feb 2015

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	9426
ISSN (Print)	0277-786X
ISSN (Electronic)	1996-756X

Conference

Conference	Optical Microlithography XXVIII
Country/Territory	United States
City	San Jose
Period	24/02/15 → 26/02/15

Bibliographical note

Publisher Copyright:
© 2015 SPIE.

Access to Document

10.1117/12.2085753

Cite this

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title = "Forbidden pitches: Causes, source optimization, and their role in design rules",

abstract = "Forbidden pitches are the result of unwanted, non-linear effects that limit yield and not always well understood. Yet, as approximations, they are implicitly deployed through design rules. Many believe they result as a consequence of more complicated light sources. We develop an analytical model of aerial image quality as a function of light source. We show the effect is most pronounced for a point light source, the simplest of all. We develop a method to improve print image quality by illumination source optimization, and show promising first results. Additionally, it is shown how design rules capture forbidden pitches unsatisfactorily.",

author = "{\c S}tefan Apostol and Paul Hurley",

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year = "2015",

doi = "10.1117/12.2085753",

language = "English",

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booktitle = "Optical Microlithography XXVIII",

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Apostol, Ş & Hurley, P 2015, Forbidden pitches: Causes, source optimization, and their role in design rules. in K Lai & A Erdmann (eds), Optical Microlithography XXVIII., 94261K, Proceedings of SPIE - The International Society for Optical Engineering, vol. 9426, SPIE, Optical Microlithography XXVIII, San Jose, United States, 24/02/15. https://doi.org/10.1117/12.2085753

Forbidden pitches: Causes, source optimization, and their role in design rules. / Apostol, Ştefan; Hurley, Paul.
Optical Microlithography XXVIII. ed. / Kafai Lai; Andreas Erdmann. SPIE, 2015. 94261K (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 9426).

Research output: Chapter in Book / Conference Paper › Conference Paper › peer-review

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T1 - Forbidden pitches

T2 - Optical Microlithography XXVIII

AU - Apostol, Ştefan

AU - Hurley, Paul

PY - 2015

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N2 - Forbidden pitches are the result of unwanted, non-linear effects that limit yield and not always well understood. Yet, as approximations, they are implicitly deployed through design rules. Many believe they result as a consequence of more complicated light sources. We develop an analytical model of aerial image quality as a function of light source. We show the effect is most pronounced for a point light source, the simplest of all. We develop a method to improve print image quality by illumination source optimization, and show promising first results. Additionally, it is shown how design rules capture forbidden pitches unsatisfactorily.

AB - Forbidden pitches are the result of unwanted, non-linear effects that limit yield and not always well understood. Yet, as approximations, they are implicitly deployed through design rules. Many believe they result as a consequence of more complicated light sources. We develop an analytical model of aerial image quality as a function of light source. We show the effect is most pronounced for a point light source, the simplest of all. We develop a method to improve print image quality by illumination source optimization, and show promising first results. Additionally, it is shown how design rules capture forbidden pitches unsatisfactorily.

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T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - Optical Microlithography XXVIII

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Y2 - 24 February 2015 through 26 February 2015

ER -

Forbidden pitches: Causes, source optimization, and their role in design rules

Abstract

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