@inproceedings{6247c459dd854e5382db567ebf3df56c,
title = "Inverse lithography using sparse mask representations",
abstract = "![CDATA[We present a novel optimisation algorithm for inverse lithography, based on optimization of the mask derivative, a domain inherently sparse, and for rectilinear polygons, invertible. The method is first developed assuming a point light source, and then extended to general incoherent sources. What results is a fast algorithm, producing manufacturable masks (the search space is constrained to recti- linear polygons), and flexible (specific constraints such as minimal line widths can be imposed). One inherent trick is to treat polygons as continuous entities, thus making aerial image calculation extremely fast and accurate. Requirements for mask manufacturability can be integrated in the optimization without too much added complexity. We also explain how to extend the scheme for phase-changing mask optimization.]]",
keywords = "algorithms, light sources, lithography, mathematical optimization",
author = "Ionescu, {Radu C.} and Paul Hurley and Stefan Apostol",
year = "2015",
doi = "10.1117/12.2085762",
language = "English",
isbn = "9781628415285",
publisher = "SPIE",
booktitle = "Proceedings of SPIE. Vol. 9426: Optical Microlithography XXVIII, 24-26 February 2015, San Jose, California, United States",
note = "Optical Microlithography (Conference) ; Conference date: 24-02-2015",
}