Inverse lithography using sparse mask representations

Radu C. Ionescu, Paul Hurley, Stefan Apostol

Research output: Chapter in Book / Conference PaperConference Paperpeer-review

1 Citation (Scopus)

Abstract

![CDATA[We present a novel optimisation algorithm for inverse lithography, based on optimization of the mask derivative, a domain inherently sparse, and for rectilinear polygons, invertible. The method is first developed assuming a point light source, and then extended to general incoherent sources. What results is a fast algorithm, producing manufacturable masks (the search space is constrained to recti- linear polygons), and flexible (specific constraints such as minimal line widths can be imposed). One inherent trick is to treat polygons as continuous entities, thus making aerial image calculation extremely fast and accurate. Requirements for mask manufacturability can be integrated in the optimization without too much added complexity. We also explain how to extend the scheme for phase-changing mask optimization.]]
Original languageEnglish
Title of host publicationProceedings of SPIE. Vol. 9426: Optical Microlithography XXVIII, 24-26 February 2015, San Jose, California, United States
PublisherSPIE
Number of pages17
ISBN (Print)9781628415285
DOIs
Publication statusPublished - 2015
EventOptical Microlithography (Conference) -
Duration: 24 Feb 2015 → …

Publication series

Name
ISSN (Print)0277-786X

Conference

ConferenceOptical Microlithography (Conference)
Period24/02/15 → …

Keywords

  • algorithms
  • light sources
  • lithography
  • mathematical optimization

Fingerprint

Dive into the research topics of 'Inverse lithography using sparse mask representations'. Together they form a unique fingerprint.

Cite this