Abstract
This work reports the effect of niobium (0–1 at%) on photocatalytic activity and the band gap of TiO2 with controlled oxygen activity in the range 10−12 Pa < p(O2)<105 Pa. It is shown that maximum of photocatalytic performance in partial water oxidation is observed for Nb-doped TiO2 containing 1 at% Nb that is processed at 1273 K in pure oxygen, p(O2) = 105 Pa. The mechanism of photocatalytic water oxidation is considered in terms of a predominant effect of photocatalytically active surface sites corresponding to titanium vacancies. It is shown that the niobium-induced increase of the band gap, surface potential and charge transport have a minor influence on photoreactivity of Nb-doped TiO2 with water.
Original language | English |
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Pages (from-to) | 243-253 |
Number of pages | 11 |
Journal | Applied Catalysis B: Environmental |
Volume | 198 |
DOIs | |
Publication status | Published - 2016 |
Keywords
- defect chemistry
- niobium
- oxide semiconductors
- photocatalysis
- titanium dioxide
- water