Surface electrical effects at the oxygen/zirconia interface during oxidation

Tadeusz Bak, Janusz Nowotny, Mieczysław Rekas, Charles C. Sorrell

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

This paper describes application of a high temperature Kelvin probe (HTKP) for studies of the outermost surface layer of materials and related charge transfers (at or in this layer) at elevated temperatures in the gas phase of controlled composition. Specifically, the paper considers application of the HTKP for surface monitoring of yttria-stabilized zirconia (10Y - ZrO2) during isothermal oxidation at 1073 and 1173 K. The obtained work function (WF) data are discussed in terms of oxygen reactivity with zirconia involving (i) oxygen chemisorption and (ii) oxygen incorporation into the outermost surface layer.

Original languageEnglish
Pages (from-to)66-73
Number of pages8
JournalBulletin of the Polish Academy of Sciences: Chemistry
Volume49
Issue number1
Publication statusPublished - 2001
Externally publishedYes

Keywords

  • Chemisorption
  • Defect chemistry
  • Interfaces
  • Oxide materials
  • Work function
  • Zirconia

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