Abstract
This paper describes application of a high temperature Kelvin probe (HTKP) for studies of the outermost surface layer of materials and related charge transfers (at or in this layer) at elevated temperatures in the gas phase of controlled composition. Specifically, the paper considers application of the HTKP for surface monitoring of yttria-stabilized zirconia (10Y - ZrO2) during isothermal oxidation at 1073 and 1173 K. The obtained work function (WF) data are discussed in terms of oxygen reactivity with zirconia involving (i) oxygen chemisorption and (ii) oxygen incorporation into the outermost surface layer.
| Original language | English |
|---|---|
| Pages (from-to) | 66-73 |
| Number of pages | 8 |
| Journal | Bulletin of the Polish Academy of Sciences: Chemistry |
| Volume | 49 |
| Issue number | 1 |
| Publication status | Published - 2001 |
| Externally published | Yes |
Keywords
- Chemisorption
- Defect chemistry
- Interfaces
- Oxide materials
- Work function
- Zirconia