Three dimensional sculpturing of vertical nanowire arrays by conventional photolithography

Run Shi; Chengzi Huang; Linfei Zhang; Abbas Amini; Kai Liu; Yuan Shi; Shuhan Bao; Ning Wang; Chun Cheng

doi:10.1038/srep18886

Three dimensional sculpturing of vertical nanowire arrays by conventional photolithography

Run Shi, Chengzi Huang, Linfei Zhang, Abbas Amini, Kai Liu, Yuan Shi, Shuhan Bao, Ning Wang, Chun Cheng

Research output: Contribution to journal › Article › peer-review

Abstract

Ordered nanoarchitectures have attracted an intense research interest recently because of their promising device applications. They are always fabricated by self-assembling building blocks such as nanowires, nanodots. This kind of bottom up approaches is limited in poor control over height, lateral resolution, aspect ratio, and patterning. Here, we break these limits and realize 3D sculpturing of vertical ZnO nanowire arrays (NAs) based on the conventional photolithography approach. These are achieved by immersing nanowire NAs in thick photoresist (PR) layers, which enable the cutting and patterning of ZnO NAs as well as the tailoring of NAs. Our strategy of 3D sculpturing of NAs promisingly paves the way for designing novel NAs-based nanoarchitectures.

Original language	English
Article number	18886
Number of pages	7
Journal	Scientific Reports
Volume	6
DOIs	https://doi.org/10.1038/srep18886
Publication status	Published - 2016

Keywords

nanowires
photolithography

Access to Document

10.1038/srep18886

Cite this

@article{8e0c257a6f2c47d094802292846a6c54,

title = "Three dimensional sculpturing of vertical nanowire arrays by conventional photolithography",

abstract = "Ordered nanoarchitectures have attracted an intense research interest recently because of their promising device applications. They are always fabricated by self-assembling building blocks such as nanowires, nanodots. This kind of bottom up approaches is limited in poor control over height, lateral resolution, aspect ratio, and patterning. Here, we break these limits and realize 3D sculpturing of vertical ZnO nanowire arrays (NAs) based on the conventional photolithography approach. These are achieved by immersing nanowire NAs in thick photoresist (PR) layers, which enable the cutting and patterning of ZnO NAs as well as the tailoring of NAs. Our strategy of 3D sculpturing of NAs promisingly paves the way for designing novel NAs-based nanoarchitectures.",

keywords = "nanowires, photolithography",

author = "Run Shi and Chengzi Huang and Linfei Zhang and Abbas Amini and Kai Liu and Yuan Shi and Shuhan Bao and Ning Wang and Chun Cheng",

year = "2016",

doi = "10.1038/srep18886",

language = "English",

volume = "6",

journal = "Scientific Reports",

issn = "2045-2322",

publisher = "Nature Publishing Group",

}

TY - JOUR

T1 - Three dimensional sculpturing of vertical nanowire arrays by conventional photolithography

AU - Shi, Run

AU - Huang, Chengzi

AU - Zhang, Linfei

AU - Amini, Abbas

AU - Liu, Kai

AU - Shi, Yuan

AU - Bao, Shuhan

AU - Wang, Ning

AU - Cheng, Chun

PY - 2016

Y1 - 2016

N2 - Ordered nanoarchitectures have attracted an intense research interest recently because of their promising device applications. They are always fabricated by self-assembling building blocks such as nanowires, nanodots. This kind of bottom up approaches is limited in poor control over height, lateral resolution, aspect ratio, and patterning. Here, we break these limits and realize 3D sculpturing of vertical ZnO nanowire arrays (NAs) based on the conventional photolithography approach. These are achieved by immersing nanowire NAs in thick photoresist (PR) layers, which enable the cutting and patterning of ZnO NAs as well as the tailoring of NAs. Our strategy of 3D sculpturing of NAs promisingly paves the way for designing novel NAs-based nanoarchitectures.

AB - Ordered nanoarchitectures have attracted an intense research interest recently because of their promising device applications. They are always fabricated by self-assembling building blocks such as nanowires, nanodots. This kind of bottom up approaches is limited in poor control over height, lateral resolution, aspect ratio, and patterning. Here, we break these limits and realize 3D sculpturing of vertical ZnO nanowire arrays (NAs) based on the conventional photolithography approach. These are achieved by immersing nanowire NAs in thick photoresist (PR) layers, which enable the cutting and patterning of ZnO NAs as well as the tailoring of NAs. Our strategy of 3D sculpturing of NAs promisingly paves the way for designing novel NAs-based nanoarchitectures.

KW - nanowires

KW - photolithography

UR - http://handle.uws.edu.au:8081/1959.7/uws:33319

U2 - 10.1038/srep18886

DO - 10.1038/srep18886

M3 - Article

SN - 2045-2322

VL - 6

JO - Scientific Reports

JF - Scientific Reports

M1 - 18886

ER -

Three dimensional sculpturing of vertical nanowire arrays by conventional photolithography

Abstract

Keywords

Access to Document

Other files and links

Fingerprint

Cite this